Savina Minimax是日本KBSEIREN株式会社（原KANEBO）开发的目前高级的无尘擦拭布系列产品，吸水吸油性极强，不磨损原件。广泛用于光学镜头制造，办公器材保养，10级以上的无尘车间净化室，半导体生产线车间等领域。
日本KBSEIREN原KANEBO公司生产的HITECLOTH 超细纤维无尘布是由Belima.X织成，其不规则的纤维排布组成适用于各种不规则物体的细微表面处理，不会掉绒毛，超柔软布质及高度抗磨损特性可应用于精密仪器之保养
规格：24CM X 24CM
包装：10片/包 100片/盒
主要用于清洁：液晶显示器，液晶显示屏，液晶触摸屏，液晶模组，背光源，偏光片，电子制造，手机组装，光学镜头，光学镜片，光学玻璃，光学眼镜，显微镜，半导体，电子生产线，无尘室，洁净室，实验室，研究所，制药，电影胶片，STN,LED，3D眼镜，办公器材保养，喷涂，航空工业，光学元器件，摄像机，摄像头，数码相机，CCD,航空仪器
High technology fields are growing every day in sophistication and precision. Highly efficient wiping cloths are essential for a strict dust-free environment in the manufacturing of such products as LSIs and LCDs. Savina Minimax was created to readily meet the needs of the times, with excellent functions enough to cope with the ultimate dust-free condition in super clean rooms.
Wipers for use in clean rooms should clean all instruments, apparatuses and peripheral devices while causing no contamination. They are also required to absorb and remove any undesired moisture. Savina Minimax, which contains all properties needed for such wipers, is one of the highest-performance wiping cloths designed for the age of high technology.
Super High-Shrinkage, High-Density Finish
Cross section of Savina Minimax
Surface of Savina Minimax
After knitting on a special high gauge knitting machine, the greige for Savina Minimax is shrunken both lengthwise and widthwise to as much as 40% of its original dimension. It is not treated with binders of any kind to achieve such a dense construction. The resultant wiping cloth has as high a surface area as 25,700 c㎡/g, thus ensuring dust removal without releasing any lint. Conventional wiping cloths have a surface area of only 2,420 c㎡/g.
Features
• Generates only a minuscule amount of lint.
• Absorbs and retains water quickly and positively.
• Has lower dissolution of residual ions and other substances.
• Provides high wiper performance (removes a maximum amount of dust without contaminating the clean room equipment).
Applications
• Production processes for photomagnetic disks, hard disks and floppy disks
• Production processes for deflection plates of liquid crystals and other items
• Compact and magnetic disk production processes
• Video deck production processes
• Contact lens production processes
• Camera assembly lines
• Printed circuit board cleaning processes
• Cleaning processes for camera lenses before coating
• Medicine production line cleaning processes
• Movie film cleaning process
• Production processes for semiconductors and integrated circuits
• Workpiece cleaning process before precision coating
savina无尘布，高科技领域正日益精密和复杂。对于LSI和LCD等产品生产过程中所需的严格无尘环境而言，高效擦拭布是必备要素。Savina MINIMAX能够轻松满足时代需求，具有出色的功能，足以应对超级无尘室中的极端无尘条件，迈腾净化代理savina mx超细无尘布，TORAYSEE MK,MC,CC，KURARAY SOLIV可乐丽无尘抹布，HUBY-340棉签、
无尘室中所使用的擦拭布应当能够清洁所有仪器、器械和外围设备，同时不会造成污染。擦拭布还要能够吸收并清除多余的水分。Savina MINIMAX具备此类擦拭布所需的所有属性，是性能的擦拭布之一，专为高科技时代而设计。 超级高收缩、高密度整理产品 Savina MINIMAX在专门的细针距针织机上编制而成，其坯布横向和纵向的收缩率均达到其原始尺寸的40%。它未经任何粘合剂处理，就达到了这样的致密结构。所得擦拭布表面积高达25,700 c㎡/g，从而确保了在不掉毛的情况下清除灰尘。而传统擦拭布的表面积仅为2,420 c㎡/■ 掉毛量极少。■ 迅速而积极地吸收并留住水分。■ 残留离子和其他物质的溶解率较低。■ 具备高端的擦拭布性能（灰尘清除量，同时不会污染无尘室设备）。■ 光磁盘、硬盘和软盘的生产过程■ 液晶偏转板以及其他物品的生产过程■ 光盘和磁盘的生产过程■ 录像机的生产过程■ 隐形眼镜的生产过程 ■ 相机装配线■ 印刷电路板的清洁工艺■ 相机镜头镀膜前的清洁工艺■ 药品生产线清洁工艺■ 电影胶片清洁工艺■ 半导体和基础电路的生产过程■ 精密涂层之前工件的清洁过程
